Common Vacuum Terminology11- Ningbo Danko Vacuum Technology Co., Ltd.

Common Vacuum Terminology11

1.coating angle：The angle between the direction of particles incident on the substrate and the normal of the plated surface.
2.vacuum sputtering：In vacuum, inert gas ions bombard atoms (molecules) or clusters from the target surface.
3.ion beam sputtering：The target is sputtered by an ion beam obtained from a special ion source.
4.glow discharge cleaning：Based on the principle of glow discharge, the surface of substrate and film is cleaned by gas discharge bombardment.China Decorative Vacuum Coating Machine Suppliers
5.PVD physical vapor deposition：In vacuum, the coating material is vaporized by physical methods such as evaporation or sputtering, and deposited on the substrate.
6.CVD chemical vapor deposition:A method of depositing new film materials on substrates by vapor chemical reactions of reacting gases with a certain chemical ratio under specific activation conditions (usually at a certain high temperature).