How to Solve the Non-uniformity of Magnetron Sputtered Films?

, the uniformity and direction of magnetic field should be ensured to form a relatively uniform space magnetic field.

Secondly, the uniformity of air pressure should be ensured as far as possible. When designing the vacuum chamber, the installation position of the vacuum pump, the wayEvaporation Vacuum Coating Machine Factory of the process gas intake and the layout of the process pipe in the chamber should be considered.

Thirdly, because the magnetic field and air pressure can not be absolutely ideal, the magnetic field can be compensated by the non-uniformity of air pressure to make the final film uniform.

Fourthly, target base distance is also an important factor affecting uniformity.