What is the target suitable for PVD sputtering coating machine?

Sputtered target material has the characteristics of high purity, high density, multi-component and uniform grain, which is generally composed of target blank and back plate. The target blank belongs to the core part of sputtering target material and is the target material bombarded by high-speed ion beam. After the target is impacted by ions, the atoms on the surface of the target are sputtered out and deposited on the substrate to form an electronic thin film. Due to the low strength of high purity metal, the sputtering target needs to complete the sputtering process in high voltage and high vacuum machine China Plasma Coating Machine Manufacturersenvironment. The sputtering target blank of ultra-high purity metal needs to be bonded with the back plate through different welding processes. The back plate mainly plays the role of fixing the sputtering target, and needs to have good electrical and thermal conductivity.

According to the different materials used, sputtering targets can be divided into metal / nonmetal single material target, alloy target and compound target. Sputtering deposition technology has good repeatability, film thickness can be controlled, can be obtained on a large area of substrate materials with uniform thickness. The films prepared have the advantages of high purity, good compactness and strong adhesion with substrate materials, which has become one of the main technologies for preparing thin film materials.

Ultra high purity metals and sputtering targets are important components of electronic materials. Sputtering target industry chain mainly includes metal purification, target manufacturing, sputtering coating and terminal application, among which target manufacturing and sputtering coating are the key links in the whole sputtering target industry chain.

The upstream metal purification is mainly from the natural key metal ores. The purity of general metals can reach 99.8%, and the purity of sputtering target needs to reach 99.999%.

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