What is the working principle of vacuum coating machine？

In the field of coating, the thickness of the film sample after coating is an important factor affecting the performance of the film. Therefore, when evaluating the performance of a film sample, it is necessary to test the performance of the film sample under different thicknesses. In the case of vacuum coating, this often requires multiple sample preparations. However, there are two problems in preparing samples for multiple times: firstly, the state of the instrument is different for the samples grown in different times, so that the factor that affects the performance of the film sample may not only be the thickness; secondly, the sample needs to be vacuumed again in the vacuum coating experiment. Obtaining is very time-consuming. Increase the cost of production and testing.

Therefore, a multi-functional magnetron sputtering coating system is provided. This system is integrated by a vacuum coating system and a glove box system. It can complete thin film evaporation in a high vacuum evaporation chamber and has high purity inert gas in the glove box. The storage and preparation of samples and the detection of samples after evaporation are carried out in an atmosphere. The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, encapsulation, testing and other processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large-area circuit preparation process The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic optoelectronic devices and circuits.

The main purpose of the multifunctional magnetron sputtering coating system: used to prepare various metal films, semiconductor films, dielectric films, magnetron films, optical films, superconducting films, sensing films and various special functional films.