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The core of DC Magnetron Sputtering Deposition System lies in the ingenious combination of DC power supply and magnetic field. In a vacuum environment, the DC power supply applies a high voltage electric field between the target and the substrate. When the electric field strength is large enough, the inert gas molecules entering the vacuum chamber are ionized to form plasma. The positive ions in these plasmas are accelerated under the action of the electric field and hit the surface of the target at a very high speed.
During the collision process, the atoms or molecules on the surface of the target are sputtered out because they obtain enough energy to form sputtered particles. These particles fly in the vacuum and eventually deposit on the surface of the substrate to form the required film. It is worth noting that this process is not just a simple physical collision, but also accompanied by complex physical and chemical reactions, such as ion neutralization, electron capture and re-emission, etc.
Simple DC sputtering may cause problems such as substrate overheating and low sputtering efficiency. DC Magnetron Sputtering Deposition System introduces a magnetic field. The magnetic field generator generates a strong magnetic field on the back of the target. This magnetic field interacts with the electric field to bind electrons near the target surface, forming a high-density plasma region. These electrons perform spiral motion in the magnetic field, increasing the frequency of collisions with the working gas molecules, improving the ionization efficiency and sputtering rate.
System Summary
Multi-arc ion & sputtering coatings can be deposited in a wide range of colors. The rang of colors can be further enhanced by introducing reactive gases into the chamber during the deposition process. The widely used reactive gases for decorative coatings are nitrogen, oxygen, argon or acetylene. The decorative coatings are produced in a certain color range, depending on the metal-to-gas ratio in the coating and the structure of the coating. Both of these factors can be altered by changing the deposition parameters.
Prior to deposition, the parts are cleaned so the surface is free of dust or chemical impurities. Once the coating process has started, all the relevant process parameters are continuously monitored and controlled by an automatic computer control system.
• Substrate Material: Glass, Metal (carbon steel, stainless steel, brass), Ceramics, Plastic, Jewelry.
• Structure Type: Vertical structure, #304 Stainless Steel.
• Coating Film: Multi-functional metal film, composite film, transparent conductive film, reflectance-increasing film, electromagnetic shielding film, decorative film.
• Film Color: multi colors, gun black, titanium golden color, rose golden color, stainless steel color, purple color, dark black, dark blue and other more colors.
• Film type: TiN, CrN, ZrN, TiCN, TiCrN, TiNC, TiALN and DLC.
• Consumables in production: Titanium, Chromium, Zirconium, Iron, alloy target; plane target, cylindrical target, twin target, opposite target.
APPLICATION:
• Glassware, such as glass cup, glass lamps, glass artworks.
• Plastic Phone Shell, Phone Parts.
• Mosaic Tile.
• Electron Industry, such as EMI film.
• Watches parts, like watch case and belt.
• Table wares, like metal forks and knives.
• Golf wares, like golf head, golf pole and golf balls.
• Sanitary Products/bathroom wares.
• Door handles & locks.
• Metal jewelry.
Tel: +86-13486478562
FAX: +86-574-62496601
Email: 
Address: No. 79 West Jinniu Road, Yuyao, Ningbo City, Zhejiang Provice, China