Common methods of PVD Technology- Ningbo Danko Vacuum Technology Co., Ltd.

Common methods of PVD Technology

RF (radio frequency) sputtering

The frequency of RF sputtering is about 13.56 MHz. It does not need hot cathode and can sputter at lower pressure and voltage. RF sputtering can depositChina PVD Coating Systems suppliers not only metal films, but also insulating dielectric films of various materials, so it has a wide range of applications.